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MM: Fachverband Metall- und Materialphysik
MM 3: Mechanical Properties and Alloy Design I
MM 3.5: Vortrag
Montag, 9. März 2026, 11:30–11:45, SCH/A215
Formation and properties of crystalline and amorphous high-entropy ZrTiTaMoWNi thin films using magnetron sputtering of a segmented target — •Anna Kornyushchenko1,2, Vyacheslav Perekrestov2, Marilena Tomut1,3, Harald Rösner1, Martin Peterlechner4, and Gerhard Wilde1,5 — 1Institute of Materials Physics, University of Muenster, Muenster, Germany — 2Laboratory of Vacuum Nanotechnologies, Sumy State University, Sumy, Ukraine — 3GSI Helmholtz Center for Heavy Ion Research, 64291 Darmstadt, Germany — 4Karlsruhe Institute of Technology, Laboratory for Electron Microscopy, 76131 Karlsruhe, Germany — 5Herbert Gleiter International Institute, Liaoning Academy of Materials, Shenyang, China
Using direct current magnetron sputtering of a segmented target under conditions of thermodynamical equilibrium, single-phase bcc or amorphous ZrTiTaMoWNi high entropy alloy layers have been formed. The crystalline layers have been obtained in the form of nano-patterns, with crystal growth occurring preferentially on the basis of (310) crystallographic plane, which aligns parallel to the substrate surface. The amorphous layers have smooth surface, featureless morphology and demonstrate structural stability. TEM studies have shown that their crystallization into a single bcc phase occurs at the annealing temperature of 800 C. The microhardness of the amorph and the crystalline films has measured to be 10 GPa and 4.6 GPa, correspondingly. Resistance to impact of swift heavy Au ions irradiation with energies 4.8 MeV/u have been compared for amorph and crystalline layers.
Keywords: single-phase crystalline high-entropy alloys; amorphous high entropy alloys; radiation harness; near-equilibrium condensation; thin films