Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe
O: Fachverband Oberflächenphysik
O 78: Vacuum Science & Technology: Theory and Applications I
O 78.3: Vortrag
Donnerstag, 12. März 2026, 11:15–11:30, HSZ/0401
Advancing Ultra-Clean Deposition of Fragile Molecular Building Blocks via Electrospray-Based Controlled Ion Beam Deposition — •Andreas Walz1,2, Annette Huettig1,2, Michael Walz1,2, Hartmut Schlichtung1,2, Patrick Lawes2, and Johannes V. Barth2 — 1pureions GmbH, Gilching, Germany — 2Technical University of Munich, Physics E20, Garching, Germany
The fabrication of functional nanostructures from organic, inorganic, or bio-relevant molecular building blocks regularly requires clean and gentle deposition in vacuum. Conventional approaches such as thermal evaporation (MBE, OMBE) are restricted to volatile species, while solution-based deposition techniques offer versatility but frequently suffer from impurities.
Controlled Ion Beam Deposition (CIBD) in UHV, equipped with an electrospray ionization (ESI) source overcomes these limitations by granting access to a broad class of large, reactive, and fragile species including functionalized organic molecules, graphene nanoribbons, proteins, and DNA. Efficient ion transfer and mass selection is ensured through fully digitally driven ion guides and a digital quadrupole mass filter (dQMF) with "virtually unlimited" mass range. Control over kinetic energy and dose allow for soft-landing or, when desired, reactive landing of the building blocks.
We present advances in ES-CIBD instrumentation and exemplary STM/AFM characterization of depositions. The technology provides a high degree of control during depositions, clean layers of mass selected molecules and access to otherwise low processability material.
Keywords: Electrospray; Ion beam deposition; mass spectrometry; soft-landing; digital quadrupol