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TT: Fachverband Tiefe Temperaturen

TT 93: Superconductivity – Poster II

TT 93.6: Poster

Donnerstag, 12. März 2026, 18:00–20:00, P4

Nanoscale Characterization of Superconducting NbN Thin Films — •Janine Lorenz^1,2,3, Sven Linzen⁴, Mario Ziegler⁴, Gregor Oelsner⁴, Rony Stolz⁴, Evgeni Il’ichev⁴, Thomas Smart¹, Yorgo Haddad¹, Marc Neis¹, Pavel Bushev¹, Rami Barends¹, F. Stefan Tautz^1,2,3, and Felix Lüpke^1,5 — ¹Peter Grünberg Institut, Forschungszentrum Jülich, Germany — ²Jülich Aachen Research Alliance (JARA), Germany — ³Institut für Experimentalphysik IV A, RWTH Aachen, Germany — ⁴Leibniz Institute of Photonic Technology, 07702 Jena, Germany — ⁵II. Physikalisches Institut, Universität zu Köln, Germany

Due to their high kinetic inductance, niobium nitride (NbN) films have recently gained attention for their application in quantum phase-slip devices. In this study, we use scanning tunnelling microscopy to investigate the spatial variation of the superconducting order parameter of NbN films grown by atomic layer deposition (ALD). Despite the increased likelihood of defect formation associated with the use of organic precursors in ALD, our measurements reveal a remarkably uniform superconducting gap, which surpasses the reported values for sputtered NbN films. We attribute this to the well controlled thickness and small grain size of ALD grown films. For a 5 nm (4 nm) NbN film grown on a silicon (sapphire) substrate, we obtain an average BCS order parameter of 2.02 meV (1.59 meV), with a standard deviation of 0.04 meV (0.05 meV). This result highlights the high homogeneity of the superconducting order parameter in ALD-grown NbN films.

Keywords: NbN; STM; STS; ALD; Superconductivity