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P: Fachverband Plasmaphysik

P 12: Atmospheric Pressure Plasmas I

P 12.1: Hauptvortrag

Mittwoch, 18. März 2026, 13:45–14:15, KH 01.020

Modelling and analysis of DBDs for thin-film deposition at atmospheric pressure — •Marjan Stankov¹, Lars Bröcker², Claus-Peter Klages², Markus M. Becker¹, and Detlef Loffhagen¹ — ¹Leibniz Institute for Plasma Science and Technology (INP), Greifswald, Germany — ²Institute for Surface Technology, Technische Universität Braunschweig, Braunschweig, Germany

Dielectric barrier discharges (DBDs) at atmospheric pressure are widely used as plasma sources for thin film deposition. The quest for non-invasive diagnostic methods able to reveal the underlying physics in such applications of DBDs has led to modelling studies emerging as a powerful solution. This contribution provides an overview on how time-dependent, spatially one-dimensional (1D-t) and two-dimensional (2D-t) fluid-Poisson models enable the investigation of the influence of Si-containing precursors like HMDS, HMDSO and TMS on the behaviour of argon DBDs in different configurations. The presentation focuses on 1D-t modelling findings on the importance of Penning ionisation of precursor molecules by excited Ar states for electron production. It highlights the outcomes of the analysis of particle surface fluxes, identifying ions as the primary contributors to deposition in discharges with a short gas residence time. It also shows how the 2D-t modelling can explain a unique discharge mode experimentally observed in the presence of small amounts of precursors. The work is funded by the Deutsche Forschungsgemeinschaft -- project no. 504701852.

Keywords: Dielectric barrier discharge; Deposition; Atmospheric pressure; Argon; Precursor