P 8: Low Pressure Plasmas II
Dienstag, 17. März 2026, 16:15–18:45, KH 01.020
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16:15 |
P 8.1 |
Hauptvortrag:
Near-plasma Chemical Surface Engineering — •Paula Navascués and Dirk Hegemann
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16:45 |
P 8.2 |
Systematic investigations of static and dynamic effects determining the performance of the ELISE negative ion source in H and D — •Joey Rubin, Dirk Wünderlich, and Ursel Fantz
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17:10 |
P 8.3 |
Plasma Sheath Tailoring for Advanced 3d Plasma Etching: Emission, Excitation and Etching Properties of a CCP Discharge — •Niklas Eichstaedt, Elia Jüngling, Meret Nürnberg, Marc Böke, and Achim von Keudell
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17:25 |
P 8.4 |
Holographic optical tweezers for dusty plasmas — Pascal König, Natascha Blosczyk, and •Dietmar Block
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17:40 |
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5 min break
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17:45 |
P 8.5 |
Nanosecond discharges at high reduced electric fields as a tool for measuring energy efficiency (G-values) — •Inna Orel, Youssef Haouchat, Tat Loon Chng, and Svetlana Starikovskaia
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18:00 |
P 8.6 |
The influence of the electrode material on rf plasma sheaths observed by force measurements on optically trapped microparticles — •Philipp Naudiet, Jessica Niemann, Viktor Schneider, and Holger Kersten
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18:15 |
P 8.7 |
Characterizing pure electron plasmas with an electron beam diagnostic in a levitating dipole trap — •Veronika Bayer, Adam Deller, Alex Card, Patrik Steinbrunner, Matthew Stoneking, and Eve Stenson
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18:30 |
P 8.8 |
Characterization of three-dimensionally extended dust clouds containing active particles under microgravity — •Stefan Schütt, Christina Knapek, Daniel Maier, Daniel Mohr, and André Melzer
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