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P: Fachverband Plasmaphysik
P 9: Low Pressure Plasmas III
P 9.5: Vortrag
Mittwoch, 18. März 2026, 12:15–12:30, KH 01.020
Ion energy dependence of plasma TMDC modifications — •Luka Hansen1,2, Markus Borchardt1, Ulrich Schürmann2,3, Chithra H. Sharma1, Kai Rossnagel1,2, Lorenz Kienle2,3, and Jan Benedikt1,2 — 1Institute of Experimental and Applied Physics, Kiel University, Kiel, Germany — 2Kiel Nano, Surface and Interface Science KiNSIS, Kiel University, Kiel, Germany — 3Department of Materials Science, Kiel University, Kiel, Germany
Transition metal dichalcogenides (TMDCs) are two-dimensional quantum materials that could enable future technologies such as qubits or next-generation semiconductors [1]. While their intriguing electronic and structural properties have been studied extensively, questions remain about how to effectively tune these properties.
Plasma is a powerful TMDC tuning tool; e.g., it can etch multilayer systems to monolayer sheets [2]. However, the underlying plasma-TMDC interaction is not well understood. To gain more insight into these processes, we use a low-pressure reactor with inverted geometry [3], which enables us to control the ion fluxes and energies individually. Ion mass spectrometry allows us to characterize these fluxes and detect ions originating from the TMDC in operando as a signature of crystal decomposition. This approach will help identify plasma conditions under which TMDCs can be modified while preserving their structural integrity.
[1] K. S. Novoselov et al., 2016 Science 353 aac9439
[2] A. Varghese et al., 2017 Nanoscale 9 3818
[3] C. Schulze et al., 2022 Plasma 5 295-305
Keywords: ion mass spectrometry; TMDC; material modification; capacitively coupled plasma; inductively coupled plasma