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DS: Dünne Schichten
DS 33: Postersitzung
DS 33.2: Poster
Dienstag, 18. März 1997, 16:15–17:45, Aula
Structural and Electrical Properties of Cathodic Sputtered Thin Chromium Films — •A.Ya. Vovk1, A.K. Butilenko1, and H.R. Khan2 — 1Institute of Magnetism NAS of Ukraine, Vernadski str. 36-b2252142, Kiev-142, Ukraine — 2Materialphysik, Forschungsinstitut f"ur Edelmetalle und Metallchemie, 73525 Schw"abisch Gm"und
Thin films of chromium are deposited on polycrystalline polished Al2O3 substrates at room temperature using vacuum arc (cathodic) sputtering technique. The gas atmospheres of Ar, N2, Ar+O2(30%), CO2, and normal atmosphere at a pressure of 9· 10−2 Pa were used during the film deposition. The structural and microstructural investigations were made by X-ray diffraction and transmission elctron microscopic techniques. The electrical resistivity was measured using 4–point technique in the temperature range of 20 and 500 K and the temperature coefficient of resistivity (TCR=(1/ρ )· (dρ /dT)) was determined. A relationship among the electrical, structural and microstructural properties of the films is discussed.
The work of A.Ya. Vovk was partially supported by INTAS program.