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DS: Dünne Schichten

DS 33: Postersitzung

DS 33.52: Poster

Dienstag, 18. März 1997, 16:15–17:45, Aula

On the modification of powder particles immersed in an RF plasma by magnetron sputtering — •H. Kersten, G. Swinkels, P. Schmetz, G. Kroesen, and F. deHoog — Department of Physics, TU Eindhoven, The Netherlands

Powder particles which are injected into an argon RF plasma acquire a negative charge. Due to this charge the particles are trapped offering the possibility of monitoring and treatment. The particles are observed by Mie-scattering ellipsometry where the polarization state of light is modulated using a rotating compensator. The size, size distribution, density, and refractive index of the particles can be obtained. The treatment of the trapped particles is done by deposition of thin metallic films by magnetron sputtering. The discharges are taylored to fit the requirements. The particle and energy fluxes from the target and the plasma towards the powder particles have been estimated from probe measurements and plasma monitoring, respectively. The fluxes determine the thin film properties on the powder which has been investigated by surface analysis (XPS, SEM).