Regensburg 1998 – wissenschaftliches Programm
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DS: Dünne Schichten
DS 24: Postersitzung
DS 24.29: Poster
Donnerstag, 26. März 1998, 15:00–19:00, PF A
Phonon Density of States in Amorphous and Crystalline Tb-Fe Thin Films Measured by Inelastic Nuclear Resonant Scattering — •W. Keune3, W. Sturhahn1, R. Roehlsberger2, E.E. Alp1, and T. Ruckert3 — 1Advanced Photon Source, Argonne National Lab., Argonne, IL 60439, USA — 2FB Physik, Univ. Rostock, D-18051 Rostock, Germany — 3Lab. f. Angew. Physik, Univ. Duisburg, D-47048 Duisburg, Germany
The recently reported new method [1,2] of inelastic nuclear scattering of
X-rays from the 14.4136 keV nuclear resonance of 57Fe was employed to
measure directly the Fe-projected phonon density of states (DOS) in
UHV-deposited 17.5 nm or 80 nm thick amorphous Tb1−xFex alloy films and
in a 80 nm TbFe2(110) film (Laves phase) epitaxially grown on
Nb(110)/Al2O3(1120). Distinct differences in the DOS
were observed for the Laves phase and the amorphous alloy of the same composition.
Characteristic quantities (recoilless fraction, kinetic energy per atom,
average phonon energy and vibrational entropy) of the Fe-vibrational
atomic motion were derived. The method is sensitive for measuring the phonon
DOS in thin films and at isotopically enriched interfaces.
M. Seto et. al., Phys. Rev. Lett. 74, 3828 (1995)
W. Sturhahn et. al., Phys. Rev. Lett. 74, 3832 (1995)
Supported in part by DFG (SFB 166) and Volkswagen-Stiftung.