Regensburg 2002 – wissenschaftliches Programm
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O: Oberflächenphysik
O 13: Postersitzung (Adsorption an Oberfl
ächen, Elektronische Struktur, Magnetismus in reduzierten Dimensionen, Epitaxie und Wachstum, Halbleiteroberfl
ächen und -grenzfl
ächen, Organische Dünnschichten)
O 13.66: Poster
Montag, 11. März 2002, 18:00–21:00, Bereich C
Adsorption of nickel on differently functionalized self-assembled monolayers — •Yian Tai, Haito Rong, Michael Zharnikov, and Michael Grunze — APC, Universität Heidelberg, D-69120 Heidelberg
X-ray photoelectron spectroscopy (XPS) and ion scattering spectroscopy (ISS) were used to characterize UHV-deposited Ni overlayers on a series of thiol-derived SAMs on Au(111), which molecular constituents have similar lengths but different head groups: HS(CH2)11CH3, HS(CH2)11OH, HS(CH2)11CH and HS(CH2)(C6H4)(C6H4)(CH2)SH. The XPS and ISS show similar results. For -CH3 terminated SAM no reaction with the terminal group was observed; the Ni atoms immediately penetrate through the SAM to the SAM/Au interface. For -OH and -COOH terminated SAM, there is a reaction between Ni and the terminal groups, resulting in the formation of a Ni overlayer at the SAM-vacuum interface. Note that the interaction between Ni and -COOH is somewhat stronger then that between Ni and -OH. However, after 6 hours, the Ni film degrades completely due to the diffusion of the Ni atom to the SAM/Au interface in the same manner as for -CH3 functionalized films. In the case of the -SH terminated SAM, it is possible to form a Ni overlayer which is stable even after 24 hours.