Regensburg 2002 – wissenschaftliches Programm

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O: Oberflächenphysik

O 33: Epitaxie und Wachstum (II)

O 33.5: Vortrag

Donnerstag, 14. März 2002, 16:30–16:45, H44

Simultaneous Measurement of Stress and Structure in a Ni Monolayer on W(110) — •Dirk Sander1, Holger L. Meyerheim1, Radian Popescu1, Sang-Hyun Kim1, Jürgen Kirschner1, Paul Steadman2, Odile Robach3, and Salvador Ferrer31MPI f. Mikrostrukturphysik, Weinberg 2, D-06120 Halle — 2Stoner Laboratory, University of Leeds, UK — 3ESRF, B.P. 220, F-38074 Grenoble, France

Stress and structure of a Ni monolayer on W(110) were investigated simultaneously in situ during growth by the crystal bending technique and by surface x-ray diffraction, respectively. A direct correlation between changes of surface stress and different Ni surface structures is found. In an extension of our previous work by curvature, LEED, and STM measurements of Ni on W(110)[1], this combined stress and X-ray study does not only confirm the intimate relation between structural changes in the Ni layer along the W[001] direction and the resulting film stress, but it also offers new insight into the atomic structure of the Ni monolayer and the W atoms underneath. A quantitative analysis of the X-ray data of the 1x7 coincidence structure at a coverage near the completion of the first layer indicates also a significant distortion of both Ni and W atomic positions along the in-plane W[110] direction. This might be due to a Ni-induced softening of the W substrate surface, which is discussed in the context of strain relief mechanisms.
D. Sander, C. Schmidthals, A. Enders, and J. Kirschner, Phys. Rev. B57, 1406 (1998)

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