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O: Oberflächenphysik
O 24: Postersitzung (Epitaxie und Wachstum, Oxide und Isolatoren, Elektronische Struktur, Oberfl
ächenreaktionen, Adsorption an Oberfl
ächen, Organische Dünnschichten)
O 24.43: Poster
Wednesday, March 26, 2003, 14:30–17:30, P1
Synchrotron Radiation induced reaction of Cu and Cl2 in the VUV — •Verena Ney and Nikolaus Schwentner — Institut für Experimentalphysik, Freie Universität Berlin, Arnimallee 14, 14195 Berlin
Light induced reactions of Cu with Cl2 are investigated. To unravel the underlying processes it is necessary to record the reaction rates during exposure. A new setup allows to monitor the reaction processes in situ. The sample material (Cu) is evaporated on a quartz crystal. It is in situ transferred to a reaction cell and operation as a microbalance enables us to determine the amount of removed, deposited or reacted material during irradiation. Light of a vacuum ultraviolet monochromator is dispersed at the plane of the sample which allows wavelength-dependent measurements. We distinguish between processes originating from gasphase excitation (non selective) and from surface excitation (selective). In addition the dark reaction is separated.
[1] V. Dietz, N. Schwentner, Surf. Science, in print
[2] H. Raaf, N. Schwentner, Applied Surf. Science, 174, 13-34 (2001)