Dresden 2003 – wissenschaftliches Programm

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O: Oberflächenphysik

O 31: Organische Dünnschichten II

O 31.14: Vortrag

Donnerstag, 27. März 2003, 18:15–18:30, HSZ/02

A laser direct writing technique for patterning of organic monolayers — •Thorsten Balgar, Nils Hartmann, and Eckart Hasselbrink — Universität Essen, Fachbereich Chemie, Universitätsstr. 5, 45141 Essen

Hydrogen-terminated silicon surfaces were locally oxidized using a highly focused argon ion laser beam in order to create prepatterned substrates for the subsequent preparation of organic monolayers. This technique allows for writing oxide patterns with a lateral resolution on the micrometer and even submicrometer scale [1]. In contrast to conventional lithographic techniques no mask is needed to transfer the patterns onto the sample surface. Preliminary experiments indicate, that alkyltrichlorosilanes in solution adsorb onto the oxidized areas and build up an alkylsiloxane monolayer [2], whereas the H-passivated areas appear to remain uncoated.

[1] M. Müllenborn, K. Birkelund and F. Grey, Appl. Phys. Lett. 69 (1996) 3013.

[2] Th. Balgar, R. Bautista, N. Hartmann and E. Hasselbrink, Surf. Sci., ECOSS-21 Proceedings, accepted.