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DS: Dünne Schichten

DS 23: Postersitzung I

DS 23.19: Poster

Friday, March 4, 2005, 16:00–18:30, Poster TU B

A new simple but rapid method to form aligned nanochannels — •Sebastian Wille, Michael Scharnberg, and Rainer Adelung — Lehrstuhl für Materialverbunde, Technische Fakultät CAU Kiel, Kaiserstr. 2, 24143 Kiel

To produce channels on the submicron- or nanometer scale is of interest for several technical applications like hydrophobic/hydrophilic interfaces for biotechnology or parallel electrical contacts for nanosized objects. Recently [1], we showed how well organized nanowires can be formed by using cracks made by thin film fractures as template. By producing the same aligned cracks in a thin film which has a low ion sputter rate, instead of deposition, we can remove material through the cracks. Nano-channels were fabricated, e.g. by the deposition of a carbon thin film on a gold coated Si or SiO₂ sample. Subsequent crack formation in the carbon layer by rapid cooling in liquid nitrogen and sputter etching to assign the cracks in the carbon layer to the subjacent Au-layer leads to the formation of insulating channels on the nanometer scale. In addition to electrical and nanoscopic characterisations we discuss the possible applications.

[1] Adelung et al., Nature Materials, Vol.3, 375 (2004)