Berlin 2005 –
scientific programme
DS 6: Anwendung dünner Schichten
Friday, March 4, 2005, 14:00–15:45, TU HS110
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14:00 |
DS 6.1 |
Invited Talk:
Strukturierung von dünnen Schichtsystemen auf EUV Photolithograpiemasken — •Jan Hendrik Peters
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14:45 |
DS 6.2 |
High resolution actinic defect inspection for EUVL multilayer mask blanks by photoemission electron microscopy — •U. Neuhäusler, A. Oelsner, M. Schicketanz, J. Slieh, N. Weber, U. Kleineberg, M. Brzeska, A. Wonisch, T. Westerwalbesloh, H. Brückl, M. Escher, M. Merkel, G. Schönhense, and U. Heinzmann
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15:00 |
DS 6.3 |
Ordered arrays of semiconductor nanoparticles using thin films of block copolymers as templates — •Dong Ha Kim, Xue Li, and Wolfgang Knoll
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15:15 |
DS 6.4 |
UV-nanoimprinting: A potential method for the fabrication of 3D-photonic crystals — •Thomas Glinsner, Farnaz Ghods Isfahani, and Kurt Hingerl
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15:30 |
DS 6.5 |
Polarization splitting based on planar photonic crystals — •Veronika Rinnerbauer, Johann Schermer, and Kurt Hingerl
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