Berlin 2005 – wissenschaftliches Programm
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O: Oberflächenphysik
O 20: Organische Dünnschichten II
O 20.2: Vortrag
Samstag, 5. März 2005, 11:00–11:15, TU EB202
A simple model system for silicon/organic interfaces: Si(111)-CH3 — •Ralf Hunger1, Rainer Fritsche1, Bengt Jaeckel1, Taek Lim1, Lauren J. Webb2, Nathan S. Lewis2, and Wolfram Jaegermann1 — 1Darmstadt University of Technology, Surface Science Division, Department of Materials Science, Petersenstr. 23, 64287 Darmstadt — 2California Institute of Technology, Division of Chemistry and Chemical Engineering, Pasadena, CA 91125
Conceptually, methyl-terminated silicon (111), Si(111)-CH3, is
one of the simplest possible silicon-organic interface structures.
The Si(111)-CH3 structure may serve as a reference system for
more complex silicon/organic interfaces. It has the inherent
advantage that the silicon surface is chemically and electronically
passivated by the methyl-termination.
Employing high resolution synchrotron and ultraviolet photoelectron
spectroscopy and low energy electron diffraction, we have analyzed
the properties of Si(111)-CH3 surfaces that were prepared in a
wet chemical two-step chlorination/alkylation process. The
investigations show that well-defined surfaces with high chemical
stability and near ideal electronic passivation could be obtained. A
(1x1) surface structure, a well-defined carbon 1s core level
emission, and in the Si2p line a distinct surface core level shift
of the carbon-bonded surface silicon atoms are found. According to
these results, methyl-terminated Si(111) appears as suitable
template for the preparation of silicon/organic hybrid device
structures.