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Berlin 2005 – wissenschaftliches Programm

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O: Oberflächenphysik

O 20: Organische Dünnschichten II

Samstag, 5. März 2005, 10:45–13:00, TU EB202

10:45 O 20.1 Interface Formation of Phthalocyanines with Hydrogen Passivated Si(111) — •Mihaela Gorgoi and Dietrich R.T. Zahn
11:00 O 20.2 A simple model system for silicon/organic interfaces: Si(111)-CH3 — •Ralf Hunger, Rainer Fritsche, Bengt Jaeckel, Taek Lim, Lauren J. Webb, Nathan S. Lewis, and Wolfram Jaegermann
11:15 O 20.3 Growth of Alkylsiloxane monolayers on patterned silicon substrates — •Thorsten Balgar, Nils Hartmann, Steffen Franzka, and Eckart Hasselbrink
11:30 O 20.4 Submicron chemical patterning of silicon substrates by laser direct writing: A simple photothermochemical model — •Nils Hartmann, Thorsten Balgar, Steffen Franzka, and Eckart Hasselbrink
11:45 O 20.5 Engineering of GaAs (100) surface with 4’-substituted aromatic self-assembled monolayers — •Michael Zharnikov, Andrey Shaporenko, Adlkofer Klaus, Avi Ulman, Michael Grunze, and Motomu Tanaka
12:00 O 20.6 In-Situ study of the first stages of F16CuPc growth on SiO2 — •Dimas Garcia de Oteyza , Esther Barrena, Oriol Ossó, Stefan Sellner, and Helmut Dosch
12:15 O 20.7 Strongly Enhanced Thermal Stability of Crystalline Organic Thin Films Induced by Aluminum Oxide Capping Layers — •S. Sellner, A. Gerlach, F. Schreiber, M. Kelsch, N. Kasper, H. Dosch, S. Meyer, J. Pflaum, M. Fischer, and B. Gompf
12:30 O 20.8 Transport in capped organic thin film transistors at elevated temperatures — •S. Meyer, J. Wrachtrup, J. Pflaum, S. Sellner, G. Ulbricht, A. Gerlach, F. Schreiber, M. Fischer, and B. Gompf
12:45 O 20.9 Post-functionalization of self-assembled alkylsiloxane monolayers for gold colloid adsorption — •Daniel Dahlhaus, Steffen Franzka, Nils Hartmann, and Eckart Hasselbrink
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