Berlin 2005 – wissenschaftliches Programm

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O: Oberflächenphysik

O 20: Organische Dünnschichten II

O 20.3: Vortrag

Samstag, 5. März 2005, 11:15–11:30, TU EB202

Growth of Alkylsiloxane monolayers on patterned silicon substrates — •Thorsten Balgar, Nils Hartmann, Steffen Franzka, and Eckart Hasselbrink — Universität Duisburg-Essen, Campus Essen, Fachbereich Chemie, Universitätsstr. 5, 45141 Essen

We present a laser direct writing technique for patterning of silicon substrates on the submicrometer scale. The patterned substrates are used for selective coating in a millimolar solution of Octadecyltrichlorosilane (OTS) [1]. The OTS molecules build up an alkylsiloxane monolayer via self-assembling in well defined surface areas [2][3]. Three different approaches were developed to create structured organic monolayers with lateral features ranging from several microns down to 120 nm.

[1] Th. Balgar, R. Bautista, N. Hartmann and E. Hasselbrink, Surf. Sci. 532-535 (2003) 963

[2] N. Hartmann, Th. Balgar, R. Bautista, S. Franzka and E. Hasselbrink, Proc. SPIE 5223 (2003) 9, Physical Chemistry of Interfaces and Nanomaterials II

[3] Th. Balgar, S. Franzka, N. Hartmann and E. Hasselbrink, Langmuir 20 (2004) 3525