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Dresden 2006 – scientific programme

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O: Oberflächenphysik

O 10: Semiconductor surfaces and interfaces

Monday, March 27, 2006, 15:00–17:45, PHY C213

15:00 O 10.1 Investigation of geometrical properties of NiMnSb-Half-Heusler thin films by X-ray reflectivity measurements. — •Andreas Stahl, Christian Kumpf, and Eberhard Umbach
15:15 O 10.2 Morphology of ultrathin manganese silicide films on Si(001) and Si(111) substrates — •Mahbube Hortamani, Peter Kratzer, and Matthias Scheffler
15:30 O 10.3 In/Si(111): Chain structure and metal-insulator transition — •Andrey Stekolnikov, Jürgen Furthmüller, and Friedhelm Bechstedt
15:45 O 10.4 Optical properties of the Si(113) 3×2 ADI surface — •Katalin Gaal-Nagy
16:00 O 10.5 Investigation of the System Hafnium/Silicon(100) by means of XPS and X-ray Photoelectron Diffraction (XPD) — •C. Fluechter, D. Weier, S. Dreiner, M. Schürmann, U. Berges, M.F. Carazzolne, A. de Siervo, R. Landers, G.G. Kleiman, C. Westphal, and E. Henschel
16:15 O 10.6 Photothermal patterning of H-terminated silicon substrates: Writing nanostructures with a micron-sized laser beam — •Rafael Bautista, Thorsten Balgar, Steffen Franzka, Nils Hartmann, and Eckart Hasselbrink
16:30 O 10.7 Photothermally induced dehydroxylation on surface-oxidized silicon substrates: A simple means for the fabrication of submicron-structured hydrophilic/hydrophobic templates — •Nils Hartmann, Thorsten Balgar, Steffen Franzka, and Eckart Hasselbrink
16:45 O 10.8 Sum-frequency generation study of hydrogen diffusion on vicinal Si(100) surfaces induced by resonant IR laser excitation — •Xu Han, Kristian Laß, and Eckart Hasselbrink
17:00 O 10.9 MOMBE growth of ZnO on SiC - a photoemission study — •Stefan Andres, Christian Pettenkofer, and Thomas Seyller
17:15 O 10.10 RF-sputtered indium-tin-oxynitride films investigated by photoelectron spectroscopy — •Marcel Himmerlich, Maria Koufaki, Manolis Sifakis, Stefan Krischok, Elias Aperathitis, and Juergen A. Schaefer
17:30 O 10.11 XPS and XPD studies on the system Hafnium(oxide) on Si(100) using soft x-rays — •D. Weier, C. Flüchter, S. Dreiner, M. Schürmann, U. Berges, M.F. Carazzolne, A. Pancotti, R. Landers, G.G. Kleiman, C. Westphal, and E. Henschel
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