Regensburg 2007 – scientific programme

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CPP: Fachverband Chemische Physik und Polymerphysik

CPP 8: POSTER: Polymer Physics

CPP 8.14: Poster

Monday, March 26, 2007, 16:00–18:00, Poster B

Surface characterization of electron-beam irradiated polymer brushes — •Sina Burkert, Frank Simon, Cornelia Bellmann, Petra Uhlmann, and Manfred Stamm — Leibniz Institute of Polymer Research Dresden, Hohe Strasse 6, D-01069 Dresden, Germany

Polymer brushes out of PS, P2VP, PNIPAMM and PAA were used to modify and control the surface potential of Si-wafers. The polymers brushes formed layers of thickness of less than 20 nm and significantly changed the surface potential of the substrate, which was investigated with contact angle measurements. Their chemical composition was studied by XPS. Electron irradiation was employed to modify the brushes by different radiation doses. With XPS and Zetapotential measurements we were able to specify the surface composition after electron beam treatment. Changes in surface composition and the structure of the grafted polymer brushes allowed to qualify cross-linkages and degradation processes. By varying the dose we could adjust on the one hand the decomposition of the polymer and on the other hand the amount of hydrophilic groups. We know that the adsorption of proteins on polymers highly depends on the surface potential. This work could be used to control the surface potential of the polymer brush as well as the adsorption of proteins, only by varying the radiation dose. The chosen substrate silicon is also attractive for lab-on-chip applications of those modified brushes.