Regensburg 2007 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 44: Poster Session II (Semiconductors; Oxides and Insulators: Adsorption, Clean Surfaces, Epitaxy and Growth; Surface Chemical Reactions and Heterogeneous Catalysis; Surface or Interface Magnetism; Solid-Liquid Interfaces; Organic, Polymeric, Biomolecular Films; Particles and Clusters; Methods: Atomic and Electronic Structure; Time-resolved Spectroscopies)

O 44.15: Poster

Mittwoch, 28. März 2007, 17:00–19:30, Poster C

Site selective growth of organic molecules — Wenchong wang¹, dingyong zhong¹, jia zhu¹, felix Kalischewski², •chuan du¹, andreas heuer², harald fuchs¹, and lifeng chi¹ — ¹Physikalisches Institut and Center for Nanotechnology (CeNTech), Universität Münster, 48149 Münster, Germany — ²Institut für Physikalische Chemie, Universität Münster, 48149 Münster, Germany

Devices with active organic layers are of great interest recently due to their less energy consumable process and potential low cost. However, the future success of these interesting materials in applications will strongly depend on fabrication processes that include patterning. We present a general method to pattern organic molecules by template-directed nucleation control using organic molecular beam deposition. Fully sites selective growth of organic molecules can be controlled at optimized conditions. We use simple Lennard-Jones (LJ) pair potentials to mimic the molecular interactions. The simulation results have good agreements with experimental data. This technique can be applied to fabricate large area uniform organic devices.