Berlin 2008 – wissenschaftliches Programm
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CPP: Fachverband Chemische Physik und Polymerphysik
CPP 10: POSTERS New Materials, Organic Semiconductors
CPP 10.3: Poster
Montag, 25. Februar 2008, 16:45–19:00, Poster A
Chemical modification and radiation induced degradation of the photoresist SU-8 — •Angela Keppler1, Marcel Himmerlich1, Christoph Kremin1, Jens T. Schumacher2, Andreas Grodrian2, Juergen A. Schaefer1, Josef Metze2, Martin Hoffmann1, and Stefan Krischok1 — 1Institut für Mikro- und Nanotechnologien, TU Ilmenau, P.O. Box 100565, 98684 Ilmenau, Germany — 2Institut für Bioprozess- und Analysenmesstechnik e.V., Rosenhof, 37308 Heilbad Heiligenstadt, Germany
An increasing interest in using the epoxy-based photoresist SU-8 for producing bio-MEMS or microfluidic devices is noticeable. In biological applications, sterilisation processes using chemical treatments or UV radiation are common practice and the analysis of their interaction with SU-8 is of great interest. Employing X-ray photoelectron spectroscopy and contact angle measurements, we have investigated the changes in the surface chemical composition upon IR, UV and X-ray irradiation as well as the impact of contact with chemicals. The treatment of SU-8 with H2SO4 results in oxidation (formation of C=O bonds) while at NaOH treated surfaces, a reduction of ether bonds is found. Radiation induced changes and degradation of the polymer induced by X-ray, UV and IR irradiation were characterised. In contrast to X-ray and IR radiation where no modification was found, UV photons preferentially attack the ether bonds in SU-8, resulting in a strong degradation of the material. The chemical changes are correlated to differences in the contact angle of the material as well as its optical properties.