Berlin 2008 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 15: Functional Oxides

DS 15.3: Hauptvortrag

Dienstag, 26. Februar 2008, 15:30–16:00, H 2032

Large Area Deposition of Transparent Conductive Oxide Films — •Bernd Szyszka, Volker Sittinger, Andreas Pflug, Stephan Ulrich, and Felix Horstmann — Fraunhofer IST, Bienroder Weg 54e, 38108 Braunschweig

Transparent and conductive oxide films such as tin doped indium oxide (ITO), fluorine or atimony doped tin oxide and aluminum doped zinc oxide are key components for optoelectronic devcies such as thin film solar cells and flat panel displays.

This paper gives and outline on the material science of TCO films with special emphasize on ZnO:Al films. These films can be deposited at low temperature by reactive AC magnetron sputtering from metallic Zn:Al targets. They are a cost effective alternative for front electrodes of a-Si:H solar cells and also for ITO for flat panel displays. Films with resistivity of * < 270 **cm and low absorption (k@550 nm < 2 x 10-3) have been grown on 100 x 60 cm2 glass substrates. The optical properties of these films are characterized by ellipsometry and spectral photometry. Advanced models based on the Gerlach Grosse theory are implemented for the evaluation of free electron properties. Structural investigations are performed using XRD, SEM and HRTEM.