Berlin 2008 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 17: Poster: Trends in Ion Beam Technology, Magnetism in Thin Films, Functional Oxides, High-k Dielectric Materials, Semiconductor Nanophotonics, Nanoengineered Thin Films, Layer Deposition Processes, Layer Growth, Layer Properties, Thin Film Characterisation, Metal and Amorphous Layers, Application of Thin Films

DS 17.1: Poster

Dienstag, 26. Februar 2008, 09:30–13:30, Poster A

Assembly of the Göttingen Proton Microbeam — •Jonas Hartwig, Holger Schebela, Gerhard Faubel, Michael Uhrmacher, and Hans Hofsäss — II. Physikalisches Institut, Georg August Universität, Friedrich Hundt Platz 1 37075 Göttingen

A microbeam system was installed in the göttingen accelerator lab. The used ion beam source is a 3 MeV Pelletron accelerator. The system consists of a russian quadruplett lens system, two adjustable slits and a target chamber with a X-ray detector and two silicon particle detectors. Between object slit and lens system two pependicular capacitors are installed to scan the beam over the target. The data acquisition is performed by a MARCO MicroDas unit and MPSYS 4 as acquisition software. These components where formerly used in Freiburg by Prof. R. Brenn. The distance between object slit and lens system is about 8m and the distance between the lenses and the target is 40cm. With this geometrical setup the object should be demagnified by factor 20 if all interferring fields will be eliminated. We aim for a beam size of 1 micrometer. The system will be used for analytical purposes (especially microPIXE) and protonbeam writing. First test results will be presented.