Berlin 2008 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 17: Poster: Trends in Ion Beam Technology, Magnetism in Thin Films, Functional Oxides, High-k Dielectric Materials, Semiconductor Nanophotonics, Nanoengineered Thin Films, Layer Deposition Processes, Layer Growth, Layer Properties, Thin Film Characterisation, Metal and Amorphous Layers, Application of Thin Films
DS 17.11: Poster
Dienstag, 26. Februar 2008, 09:30–13:30, Poster A
Investigation of Metal-Oxide Diffusion Barriers in fluorescent lamps using XPS Depth Profiling — •Christian Berthold1, Alexandre Santos Abreu1, Matthias Knoll1,2, Armin Konrad2, Reinhard Tidecks1, and Siegfried Horn1 — 1Universität Augsburg, Institut für Physik, EP II, Universitätsstr. 1, D-86159 Augsburg — 2OSRAM GmbH, FL/CFL D-A, Berliner Allee 65, D-86135 Augsburg
Mercury reduction in fluorescent lamps has become an important environmental issue recently. The goal is to increase the lamps lifetime and at the same time to reduce the amount of mercury dosed into the lamp. To this end, different metal-oxide coatings used as a diffusion barrier for mercury were examined using photoelectron spectroscopy (XPS). The purpose of the investigations was to establish a mercury depth profile within the diffusion barrier.
By layer-to-layer sputtering the surface sensitivity of XPS allows to determine the amount of mercury relative to an element within the diffusion barrier. From the depth profile the effectiveness of various diffusion barriers was determined. The experimentally obtained depth profiles of the mercury concentration within the coating can be described by Fick's laws with an infinite mercury reservoir as boundary condition. We will present the sample preparation as well as different diffusion profiles gained from miscellaneous metal-oxide layers.