Berlin 2008 – wissenschaftliches Programm
Bereiche | Tage | Auswahl | Suche | Downloads | Hilfe
DS: Fachverband Dünne Schichten
DS 17: Poster: Trends in Ion Beam Technology, Magnetism in Thin Films, Functional Oxides, High-k Dielectric Materials, Semiconductor Nanophotonics, Nanoengineered Thin Films, Layer Deposition Processes, Layer Growth, Layer Properties, Thin Film Characterisation, Metal and Amorphous Layers, Application of Thin Films
DS 17.20: Poster
Dienstag, 26. Februar 2008, 09:30–13:30, Poster A
Ion-beam assisted deposition of textured transition metal nitride films — •Martin Kidszun, Ruben Hühne, Konrad Güth, Bernhard Holzapfel, and Ludwig Schultz — IFW Dresden, Institute for Metallic Materials, P.O. Box 270116, D-01171 Dresden, Germany
Ion-beam assisted deposition (IBAD) offers the opportunity to prepare thin textured films on amorphous or non-textured substrates. It was shown within the last decade that thin cube textured layers of materials with a rocksalt structure like MgO or TiN can be produced on amorphous seed layers using this technique. In general, a reactive IBAD process using pulsed laser deposition of transition metals in combination with a nitrogen-containing ion beam was used for the preparation of different transition metal nitride layers. The results on the in-plane textured growth of TiN are promising for the development of conducting buffer layer architectures for YBCO coated conductors based on the IBAD approach. Recent results on the realisation of such an architecture using different substrates as Si/Si3N4 or polished Hastelloy tapes will be presented. Furthermore, this approach was used to prepare textured superconducting transition metal nitride thin films as for instance NbN. Detailed measurement of the structural and superconducting properties of such layers will be presented.