Berlin 2008 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 17: Poster: Trends in Ion Beam Technology, Magnetism in Thin Films, Functional Oxides, High-k Dielectric Materials, Semiconductor Nanophotonics, Nanoengineered Thin Films, Layer Deposition Processes, Layer Growth, Layer Properties, Thin Film Characterisation, Metal and Amorphous Layers, Application of Thin Films

DS 17.62: Poster

Dienstag, 26. Februar 2008, 09:30–13:30, Poster A

Metal organic chemical vapour deposition of SrRuO₃ thin films on SrTiO₃ — •Rasuole Dirsyte, Jutta Schwarzkopf, Günter Wagner, and Roberto Fornari — IKZ, Max Born - Straße 2, D - 12489 Berlin, Germany

SrRuO₃ with pseudo-cubic crystalline structure (a = 0.393 nm) appears to be one of the most suitable conductive oxides to be used as bottom electrode for the oxide-based electronic devices, due to its high conductivity and low lattice misfit with many functional perovskite transition metal oxides [1]. Furthermore, this electrode has a lower density of defects (oxygen vacancies, dislocations, dead layer) compared with metal electrodes (Pt, Ru, Ir) [2].

A vertical liquid-delivery metal-organic chemical vapour deposition (MO-CVD) reactor was used to deposit (100)-oriented SrRuO₃ films on vicinal SrTiO₃(100) substrates. In order to grow epitaxial thin films with low defect density and high electrical conductivity and to optimise the deposition parameters, the influence of deposition temperature (500 - 700 ^∘C), argon/oxygen ratio (1,6 - 3,3), total gas flow (4875 - 8125 sccm) and reactor pressure (12 mbar - 40 mbar) was investigated.

Composition of the films was identified by GDOES technique. Raman and XRD were used to determine film orientation and the surface morphology and roughness was analysed by AFM and SEM microscopy.

[1] O. Gautreau, C.Harnagea, F. Normandin, T.Veres, A. Pignolet, Thin Solid Films 515, 4580 (2007).

[2] N. Menou, H. Kuwabara, and H. Funakubo, Jpn. J. Appl. Phys. 46, 2139 (2007).