Berlin 2008 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 17: Poster: Trends in Ion Beam Technology, Magnetism in Thin Films, Functional Oxides, High-k Dielectric Materials, Semiconductor Nanophotonics, Nanoengineered Thin Films, Layer Deposition Processes, Layer Growth, Layer Properties, Thin Film Characterisation, Metal and Amorphous Layers, Application of Thin Films

DS 17.64: Poster

Dienstag, 26. Februar 2008, 09:30–13:30, Poster A

Measurement of the internal mechanical dissipation in dielectric thin films — •Stefanie Kroker¹, Christian Schwarz¹, Daniel Heinert¹, Ronny Nawrodt¹, Anja Schroeter¹, Ralf Neubert¹, Matthias Thürk¹, Sandor Nietzsche¹, Wolfgang Vodel¹, Andreas Tünnermann², and Paul Seidel¹ — ¹Institut für Festkörperphysik, Helmholtzweg 5, 07743 Jena, Germany — ²Institut für Angewandte Physik, Albert-Einstein-Straße 15, 07745 Jena, Germany

Gravitational wave detectors currently under operation are limited by different kinds of noise. One of the fundamental noise sources of future detectors will be thermal noise arising from the dielectric coatings of the optics. In order to fulfil the requirements for the third generation gravitational wave detectors it is necessary to reduce the mechanical dissipation of the dielectric thin films by at least a factor of 2. Thus, it is necessary to understand the internal mechanisms that cause mechanical loss. We present a novel set-up to measure the internal mechanical dissipation of thin films (<1 µ m) on silicon substrates. We present results for tantala (Ta₂O₅) and silica (SiO₂) within a temperature range from 5 to 300 K.

This work is supported by the German science foundation under contract SFB Transregio 7.