Berlin 2008 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 18: Poster: Towards Molecular Spintronics, Organic Thin Films, Optical Layers, Vibrational Spectroscopy, Tayloring organic interfaces
DS 18.32: Poster
Dienstag, 26. Februar 2008, 14:30–19:30, Poster A
In-situ monitoring of electrochemically prepared organic films — •Karsten Hinrichs1, Simona Silaghi1, Matthias Intelmann2, Katy Roodenko1, Norbert Esser2, and Jörg Rappich1 — 1ISAS - Institute for Analytical Sciences, Department Berlin, Albert-Einstein-Str. 9, 12489 Berlin, Germany — 2Hahn-Meitner-Institut Berlin GmbH, Abt. Silizium-Photovoltaik, Kekuléstr. 5, 12489 Berlin, Germany
In-situ investigations of Si surfaces during electrochemical modification can elucidate reaction schemes and process steps. Such studies provide information about intermediate surface species during processing and species post-formed after the treatment in solution. Grafting of organic molecules is a widely used process to functionalize the silicon surface with respect to nanopatterning, passivation or change in electronic properties. In the presented work infrared spectroscopic ellipsometry (IRSE) and reflectance anisotropy spectroscopy were applied for in-situ monitoring of the electrochemical growth of thin organic films at the silicon-liquid interface. In particular the spectra taken during the growth of a few nm thick polypyrrole and nitrobenzene films will be discussed.