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Berlin 2008 – scientific programme

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DS: Fachverband Dünne Schichten

DS 22: High-k Dielectric Materials - Synthesis, Properties, Applications

Wednesday, February 27, 2008, 16:45–18:30, H 2032

16:45 DS 22.1 Invited Talk: Development of novel processes for atomic layer deposition of high-k dielectrics — •Jaakko Niinistö, Kaupo Kukli, Mikko Ritala, and Markku Leskelä
17:15 DS 22.2 Invited Talk: Towards a better understanding of the dielectric collapse in high-K BST thin film capacitors — •Regina Dittmann, Rafael Plonka, Nikolay Pertsev, Susanne Hoffmann-Eifert, and Rainer Waser
17:45 DS 22.3 From hexagonal Pr2O3 films to lattice matched twin-free PrO2/Si(111) with cubic structureThomas Weisemoeller, Andreas Greuling, Sebastian Gevers, Carsten Deiter, and •Joachim Wollschläger
18:00 DS 22.4 Structural, chemical and electrical characterization of HfNO-HfTiO high-k dielectric stackVisorian Mikhelashvili, Gadi Eisenstein, Thangadurai Paramasivam, and •Wayne Kaplan
18:15 DS 22.5 Photoemission and absorption spectroscopy for in situ investigations of the ALD growth — •Massimo Tallarida, Konstantin Karavaev, Dieter Schmeisser, and Ehrenfried Zschech
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