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Berlin 2008 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 25: Trends in Ion Beam Technology: From the Fundamentals to the Application

DS 25.4: Vortrag

Donnerstag, 28. Februar 2008, 12:00–12:15, H 2013

Optical anisotropy induced by oblique incidence ion bombardment of Ag(001) — •Herbert Wormeester, Frank Everts, and Bene Poelsema — Solid State Physics, MESA+ Institute for Nanotechnology,

Oblique incidence ion sputtering has become a widely used method for the creation of highly regular patterns of lines and dots. On a Ag(001) surface oblique incidence sputtering creates a ripple pattern that exhibits plasmonic features. The photon energy of the plasmonic feature depends on the ripple periodicity. The development of these anisotropic features was measured in-situ with the optical technique Reflection Anisotropy Spectroscopy (RAS) for 2 keV Ar ions with a flux of a few µ A/cm2 in a temperature range of 300 - 420K. With RAS, a periodicity of ripples above 200 nm is measured by a shift in photon energy of the plasmon resonance. Features with a smaller periodicity show a plasmon resonance around 3.65 eV. The Rayleigh-Rice description for scattering from a slightly rough surface enables to relate the measured plasmonic feature quantitatively to the ripple’s rms, wavelength and wavelength distribution. Ripple patterns created with ions at 70 and 80 polar angles of incidence are compared. High resolution LEED measurements after sputtering are used to determine the facet angles of the created ripples.

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