Berlin 2008 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 29: Nanoengineered Thin Films
DS 29.1: Vortrag
Donnerstag, 28. Februar 2008, 18:00–18:15, H 2013
Glancing angle deposited Si nanostructures on differently patterned substrates — •Christian Patzig1, Bernd Rauschenbach1, and Bodo Fuhrmann2 — 1Leibniz Institute of Surface Modification, Permoserstraße 15, 04318 Leipzig, Germany — 2Martin-Luther-Universät Halle, Heinrich-Damerow-Straße 4, 06120 Halle, Germany
The glancing angle deposition (GLAD) process is a sophisticated vacuum deposition method that allows for the growth of arbitrarily shaped, 3D structures on the nm scale. When the substrate is tilted during deposition in a way that the incoming particle flux strikes it under an highly oblique angle β (typically β > 80∘ as measured to the substrate normal), self-shadowing conditions on the substrate surface lead to the growth of non-closed films, that consist of needles which are slanted towards the incoming flux of sputtered particles. In addition with an appropriate substrate rotation mechanism, different structures such as zigzags, vertical posts, spirals or screws can be sculpted. Here, the growth of Si nanostructures on bare Si substrates as well as on differently patterned substrates (electron beam lithography pre-patterned, nano sphere lithography pre-patterned) will be shown, and the influence of the periodicity and form of the used pattern on the growth of the structures will be discussed.