Berlin 2008 – wissenschaftliches Programm
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MA: Fachverband Magnetismus
MA 21: Magnetic Thin Films II
MA 21.3: Vortrag
Mittwoch, 27. Februar 2008, 14:30–14:45, H 1012
Characterization and nanopatterning of Ni2MnIn Heusler films — •Jan M. Scholtyssek, Jeannette Wulfhorst, Ulrich Merkt, and Guido Meier — Institut für Angewandte Physik und Zentrum für Mikrostrukturforschung, Universität Hamburg, Jungiusstr. 11, 20355 Hamburg
The Heusler alloy Ni2MnIn is a promising material as spin injector because of its predicted half-metallicity at the interface to InAs. We grow thin films of this Heusler alloy by thermal coevaporation of Nickel and the alloy MnIn. The alloy is grown on Si3N4 membranes and amorphous carbon films for transmission-electron microscopy (TEM) as well as on Si and InAs. The degree of the transport spin polarization of the films grown on Si(100), InAs(100) and in-situ cleaved (110) surfaces of InAs is determined by point-contact Andreev reflection spectroscopy (PCAR) [1]. The almost perfect lattice match between InAs and Ni2MnIn supports highly oriented growth, as we have proven by electron diffraction under grazing incidence [2]. Lateral spin valves with Heusler electrodes are lithographically defined. In view of the temperature-sensitivity of the optical and electron-beam resists, the samples are grown at substrate temperatures of 50 ∘C and annealed up to 400 ∘C afterwards. The post-growth annealing process is investigated in situ in the TEM using transmission-electron diffraction on structured samples grown on Si3N4 membranes.
L. Bocklage, J.M. Scholtyssek, U. Merkt, and G. Meier, J. Appl. Phys. 101 09J512 (2007).
[2] J.M. Scholtyssek, L. Bocklage, R. Anton, U. Merkt, and G. Meier, J. Magn. Magn. Mat. 316, e923 (2007).