Berlin 2008 – wissenschaftliches Programm
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MM: Fachverband Metall- und Materialphysik
MM 30: Mechanical Properties II
MM 30.1: Vortrag
Mittwoch, 27. Februar 2008, 15:45–16:00, H 0111
Tensile tests of magnetron sputtered nanocrystalline palladium (exchanged with MM 29.5) — •Anna Castrup1,2, Sebastian Gottschalk1, Horst Hahn1,2, Rudolf Baumbusch3, Patric Gruber3, and Oliver Kraft3 — 1Institute of Nanotechnology, Forschungszentrum Karlsruhe GmbH, P.O. Box 3640, D-76021 Karlsruhe, Germany — 2Institute for Materials Science, Thin Films Division, Darmstadt University of Technology, Petersenstr. 23, D-64287 Darmstadt, Germany — 3IZBS, University of Karlsruhe, Kaiserstr. 12, 76131 Karlsruhe, Germany
Nanocrystalline Pd films of 1 µm thickness were prepared by rf magnetron sputtering on Kapton substrates. The films were sputtered by use of nanoscale multilayer technology with individual deposition layer thicknesses ranging between 1 and 20 nm at various sputter conditions.
The resulting grain size and texture were characterized using TEM and conventional XRD measurements. Tensile tests were performed ex-situ as well as in-situ in a synchrotron diffractometer. Peak form analysis reveals intrinsic and extrinsic stacking fault density and twin density, which depend on the applied strain rate. Considered deformation mechanisms are: grain boundary sliding, grain rotation and the formation of stacking faults. It is investigated whether the formation of these defects is reversible after relaxation.