Berlin 2008 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 18: Poster Session I - MA 141/144 (Atomic Wires; Size-Selected Clusters; Nanostructures; Metal Substrates: Clean Surfaces+Adsorption of Organic / Bio Molecules+Solid-Liquid Interfaces+Adsorption of O and/or H; Surface or Interface Magnetism; Oxides and Insulators: Clean Surfaces)
O 18.38: Poster
Montag, 25. Februar 2008, 18:30–19:30, Poster F
In-situ atomic-scale studies of the mechanisms and dynamics of bismuth electrodeposition by Video-STM — •Hisayoshi Matsushima1, Erwin S. Lin2, Sylvie Morin2, and Olaf M. Magnussen1 — 1Institut für Experimentelle und Angewandte Physik, Universität Kiel, Kiel, Germany — 2Chemistry Department, York University, Ontario, Canada
We present direct studies of mechanisms and dynamics of underpotential (UPD) and overpotential (OPD) electrodeposition of bismuth on Au(111) in 0.1 M HClO4 solution by in-situ high-speed scanning tunneling microscopy (Video-STM). Nucleation of Bi second layer islands in the OPD regime occurs heterogeneously at domain boundaries of the UPD layer, starting by trapping of isolated Bi adatoms. High-resolution images of the anisotropic (needle-like) growth [1] reveal the motion of bilayer kinks along the needle edges, indicating parallel growth of both layers.
[1] C. A. Jeffrey, D. A. Harrington and S. Morin, Surf. Sci., 512, L367 (2002)