Berlin 2008 –
            
              wissenschaftliches Programm
            
          
        
        
        
        
        
      
      
  
    
  
  O 33: Symposium: Frontiers of Surface Sensitive Electron Microscopy I (Invited Speakers: James Hannon, Raoul van Gastel, Thomas Schmidt)
  Dienstag, 26. Februar 2008, 13:45–16:15, MA 005
  
    
  
  
    
      
        
          
            
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          13:45 | 
          O 33.1 | 
          
            
              Hauptvortrag (ohne Erstattung):
            
            
              
                Dynamics at Strained Surfaces — •James B. Hannon
              
            
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          14:15 | 
          O 33.2 | 
          
            
              Hauptvortrag (ohne Erstattung):
            
            
              
                The role of long-range interactions in determining surface morphologies: a combined LEEM/SXRD study — •Raoul van Gastel
              
            
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          14:45 | 
          O 33.3 | 
          
            
            
              
                Real Time Imaging of Surface Diffusion Fields during Island decay — •Dirk Wall, Kelly R. Roos, Kimberly L. Roos, Ingo Lohmar, Joachim Krug, Michael Horn-von Hoegen, and Frank-J. Meyer zu Heringdorf
              
            
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          15:00 | 
          O 33.4 | 
          
            
            
              
                Structural imaging of surface oxidation and oxidation catalysis on transition metal surfaces — •Jan Ingo Flege and Peter Sutter
              
            
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          15:15 | 
          O 33.5 | 
          
            
            
              
                Photoemission electron microscopy investigation of organic thin films — •Maria Benedetta Casu, Indro Biswas, Mathias Nagel, Peter Nagel, Stefan Schuppler, and Thomas Chassé
              
            
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          15:30 | 
          O 33.6 | 
          
            
            
              
                Characterization of nanosize buried defect in Mo/Si  multilayer structure by EUV photoemission electron microscopy — •jingquan lin, jochen maul, nils weber, matthias escher, michael merkel, gerd schoenhense, and ulf kleineberg
              
            
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          15:45 | 
          O 33.7 | 
          
            
              Hauptvortrag (ohne Erstattung):
            
            
              
                SMART - Spectromicroscopy with aberration correction for high resolution surface characterization — •Th. Schmidt, F. Maier, H. Marchetto, P. Lévesque, U. Groh, R. Fink, H.-J. Freund, E. Umbach, and SMART- Collaboration
              
            
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