Berlin 2008 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 53: Surface Nanopatterns
O 53.12: Vortrag
Mittwoch, 27. Februar 2008, 18:00–18:15, MA 043
Ordered nanomasks on Si and SiO2 surfaces for the preparation of templates on the nanoscale — •Alfred Plettl, Marc Saitner, Fabian Enderle, Achim Manzke, Christian Pfahler, and Paul Ziemann — Institut für Festkörperphysik, Universität Ulm, D-89069 Ulm, Germany
Periodically ordered nanomasks are generated by a micellar technique [1], a miniemulsion technique [2] and an extension of a well known colloidal patterning method (Fischer pattern) to the sub100 nm regime by a new isotropic plasma etching procedure. For template preparation an ICP-RIE plasma etcher is used subsequently. CF4/CHF3-gas mixtures were applied for manipulation of Si [3] and SiO2 surfaces. The order of the masks is transferred into arrays of pillars or holes from the sub10 nm scale to standard subµm scale with aspect ratios of about 10 for the smallest structures. Combining these unconventional lithography techniques with the conventional electron beam lithography offers the possibility for nonperiodic arrangements. Some examples of application will be given.
[1] G. Kästle et al., Adv. Funct.Mat. 13, 853 (2003).
[2] A. Manzke et al., Adv. Mater. 19, 1337 (2007).
[3] S. Brieger et al., Nanotechnology 17, 4991 (2006).