Berlin 2008 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 55: Poster Session III - MA 141/144 (Methods: Atomic and Electronic Structure; Particles and Clusters; Heterogeneous Catalysis; Semiconductor Substrates: Epitaxy and Growth+Adsorption+Clean Surfaces+Solid-Liquid Interfaces; Oxides and Insulators: Solid-Liquid Interfaces+Epitaxy and Growth; Phase Transitions; Metal Substrates: Adsorption of Inorganic Molecules+Epitaxy and Growth; Surface Chemical Reactions; Bimetallic Nanosystems: Tuning Physical and Chemical Properties; Oxides and insulators: Adsorption; Organic, polymeric, biomolecular films; etc.)

O 55.55: Poster

Mittwoch, 27. Februar 2008, 18:30–19:30, Poster F

Properties of ultrathin In layers on the Ni(111) face — •Wojciech Linhart, Tomasz Tokarz, Agnieszka Gorzelska, Zbigniew Jankowski, and Aleksander Krupski — Institute of Experimental Physics, University of Wroclaw, pl. Maxa Borna 9, 50-204 Wroclaw, Poland

The atomic structure and morphology of ultrathin In layers on the Ni(111) face deposited in ultrahigh vacuum at the substrate temperature ranging from 150 K to 700 K were investigated with the use of Auger electron spectroscopy (AES), low-energy electron diffraction (LEED) including I-V LEED and directional elastic peak electron spectroscopy (DEPES).