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Berlin 2008 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 63: Symposium: Frontiers of Surface Sensitive Electron Microscopy II (Invited Speakers: Jürgen Kirschner, Liviu Chelaru, Michael Bauer, Claus Schneider)

Donnerstag, 28. Februar 2008, 09:30–12:30, MA 043

09:30 O 63.1 Hauptvortrag (ohne Erstattung): Development of a “momentum microscope” for imaging of valence band electron states — •Juergen Kirschner, Burkhard Kroemker, and Matthias Escher
10:00 O 63.2 Hauptvortrag (ohne Erstattung): Imaging Surface Plasmon Polaritons: Time-resolved Two-Photon Photoelectron Emission Microscopy — •Liviu I. Chelaru
10:30 O 63.3 A PEEM Study of the Substrate Dependence of Pentacene Thin Film Growth on Silicon — •Simone Möllenbeck, Dagmar Thien, Peter Kury, Kelly R. Roos, Dirk Wall, Michael Horn-von Hoegen, and Frank-J. Meyer zu Heringdorf
10:45 O 63.4 Hauptvortrag (ohne Erstattung): Subwavelength control of nano-optical fields probed by non-linear PEEMMartin Aeschlimann, •Michael Bauer, Daniela Bayer, Tobias Brixner, F. Javier Garcia de Abajo, Walter Pfeiffer, Martin Rohmer, Christian Spindler, and Felix Steeb
11:15 O 63.5 Energy and time resolved photoelectron emission microscopy (PEEM) measurements of nanostructured surfaces — •Christian Schneider, Martin Rohmer, Daniela Bayer, Michael Bauer, and Martin Aeschlimann
11:30 O 63.6 Hauptvortrag (ohne Erstattung): Probing thin film magnetism by photoemission microscopy — •Claus M. Schneider
12:00 O 63.7 Microscopic investigation of exchange bias in Ni/FeMn bilayers — •Florian Kronast, Joachim Schlichting, Ruslan Ovsyannikov, Florin Radu, Shrawan Mishra, Hermann Dürr, and Wolfgang Eberhardt
12:15 O 63.8 Imaging ferroelectric domains with reflected low energy electrons — •Salia Cherifi
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