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P: Fachverband Plasmaphysik

P II: Poster: Niedertemperaturplasmen, Plasmatechnologie

P II.20: Poster

Dienstag, 11. März 2008, 11:00–13:00, Poster C3

A retarding field analyzer for arbitrarily biased substrates in reactive plasmas — •Tim Baloniak and Achim von Keudell — Ruhr-Universität Bochum, Bochum, Germany

Thin film deposition is one important application of modern plasma physics. Plasma ions are accelerated in the plasma sheath and impinge onto a growing film surface. The ion energy distribution function (IEDF) is of key importance for the properties of the deposited films. The IEFD can be manipulated by applying an external bias voltage to the substrates. In this work, the interplay of a non-sinusoidal biasing, the ion energy distribution and the resulting film properties is under investigation. Measurements are performed in a capacitively coupled plasma which is heated by 13.56 MHz. The substrates are placed on an arbitrarily biased electrode. A miniaturized floating retarding field energy analyzer (RFEA) allows for IEDF measurements on the biased electrode. First results obtained for non-reactive argon plasmas are compared to measurements performed by a commercially available floating RFEA and to modeling.