Dresden 2009 – wissenschaftliches Programm
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MA: Fachverband Magnetismus
MA 13: Poster Ia: Electron Theory (1); Magnetic Imaging (2,3); Thin Films (4-25); MSMA (26-33); Magn. Semiconductors (34-42); Magn. Half Metals and Oxides (43-60)
MA 13.12: Poster
Dienstag, 24. März 2009, 10:15–13:00, P1A
Epitaxial Fe3Si films: Structure, electrical and magnetic properties — •Joachim Schumann1, Hartmut Vinzelberg1, Christoph Deneke1, Dieter Elefant1, Jürgen Thomas1, Ernest Arushanov1,2, and Oliver G. Schmidt1 — 1IFW Dresden, P.O.Box 270116, D-01171 Dresden, Germany — 2Institute of Applied Physics, 277028 Chisinau, Moldowa
Epitaxial Fe3Si films have been prepared by means of UHV electron beam co-evaporation on GaAs (100) substrates for studies on planar [1] and cylindrically shaped [2] samples. High resolution TEM shows that the films are grown with a high crystalline quality and a good interface perfection what makes them comparable with the best Fe3Si MBE layers. The electrical measurements present a low-temperature T 3 term describing the anomalous single-magnon scattering processes in half-metallic materials. So, the hypothesis of half-metallic ferromagnetism in Fe3Si can be considered as confirmed [1]. The films have an anisotropic magnetoresistance in low magnetic fields. In high magnetic fields a negative longitudinal and transverse magnetoresistance (MR) was found. In the vicinity of 200 K the MR shows a maximum of about 1.5% at fields of about 8 T. The magnetic moment was determined as 0.86 µB/atom close to the bulk value of Fe3Si.
[1] H. Vinzelberg et al., J. Appl. Phys. 104, 093707 (2008).
[2] C. Deneke, et al., phys.stat.sol.(c) 5, 2704 (2008).