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P: Fachverband Plasmaphysik
P 11: Poster: Staubige Plasmen
P 11.22: Poster
Dienstag, 31. März 2009, 17:30–19:30, Foyer des IfP
Particles and thin films deposited by Ar/C2H2 and Ar/CH4 plasmas — •Hoang Tung Do1, Robert Bogdanowicz2, Vladimir Danilov1, Jürgen Meichsner1, Marcin Gnyba2, and Rainer Hippler1 — 1Institute of Physics, University of Greifswald, D-17487 Greifswald, Germany — 2Department of Optoelectronics and Electronic Systems, Gdansk University of Technology, PL-80952 Gdansk, Poland
Particles and thin films have been deposited by Ar/C2H2 and Ar/CH4 plasmas under various conditions. The development of plasma was monitored by tunable diode laser absorption spectroscopy via the time evolvement of argon metastable density. The films were analysed by different methods: Fourier transform infrared spectroscopy, Raman spectroscopy and spectroscopic ellipsometry. The results will be compared and discussed.