Regensburg 2010 – wissenschaftliches Programm
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CPP: Fachverband Chemische Physik und Polymerphysik
CPP 14: Poster: Interfaces and Thin Films
CPP 14.21: Poster
Montag, 22. März 2010, 16:30–18:00, Poster C
Self Stratification in polymer blend films during spin-coating — •Cheng Huang1, Jörg Pfeifer1, Stefan Walheim1, and Thomas Schimmel1,2 — 1Institute of Nanotechnology (INT), Northern Campus, Karlsruhe Institute of Technology (KIT) — 2Institute of Applied Physics, Southern Campus, Karlsruhe Institute of Technology (KIT)
The phase separation process of PS/PMMA blend during spincoating from a Methy-Ethyl-Ketone (MEK) solution is studied. The polymer blend dissolved in this solution forms a purely lateral structure on a hydrophilic substrate with PS cylinders in PMMA matrix. Our results of time-resolved in situ reflectometry, post cast ellipsometry and SEM(scanning electron microscope) cross-sectional analysis point in the direction of a transient triplelayer formation during the spin-coating process which then transforms via an instability into the final lateral morphology. A purely horizontally layered situation in the dry state can also be tuned by process parameters. Humidity, spin rate and the concentration of the polymer blend solution are the most important parameters which define the final structure. The PS or PMMA phase was later selectively dissolved and the film was subsequently used as a lithographic Mask for further applications.