Regensburg 2010 – wissenschaftliches Programm
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CPP: Fachverband Chemische Physik und Polymerphysik
CPP 14: Poster: Interfaces and Thin Films
CPP 14.23: Poster
Montag, 22. März 2010, 16:30–18:00, Poster C
Self-Alignment of Block Copolymers on Chemically Patterned Substrates — •Tobias Heiler1, Roland Gröger1, Stefan Walheim1, and Thomas Schimmel1,2 — 1Institute of Nanotechnology (INT), Northern Campus, Karlsruhe Institute of Technology (KIT) — 2Institute of Applied Physics, Southern Campus, Karlsruhe Institute of Technology (KIT)
Chemical patterns were made by nanoshaving polymer brush layers on silicon oxide. The contrast in polarity between brush surface and exposed silicon oxide was used to control the phase morphology of an amphiphilic block copolymer film. The two components of the block copolymer, as well as the surface of the chemically patterned substrate possess a high contrast in polarity, so that a defect tolerant pattern replication in the polymer film is observed after a short (vapor-)annealing process. Polybutadiene-based block copolymers and polystyrene brushes were used.