Regensburg 2010 – wissenschaftliches Programm
Bereiche | Tage | Auswahl | Suche | Downloads | Hilfe
CPP: Fachverband Chemische Physik und Polymerphysik
CPP 30: Poster: Micro and Nanofluidics
CPP 30.3: Poster
Mittwoch, 24. März 2010, 17:30–19:00, Poster C
Wetting of hydrophobic periodic nanotemplates on Si-surfaces — •Stefan Wiedemann1, Stefan Heindl1, Kay Egloff2, Alfred Plettl1, Sabine Hild3, and Paul Ziemann1 — 1Institut für Festkörperphysik, Universität Ulm, 89069 Ulm, Germany — 2Institut für Experimentelle Physik, Universität Ulm, 89069 Ulm, Germany — 3Institut für Polymerwissenschaften, Universität Linz, A-4040 Linz, Austria
To influence the wetting behavior of a Si surface, periodically ordered nanomasks were prepared by a micellar[1] and photoseeding technique and used to fabricate extended arrays of nanopillars on a Si wafer by RIE etching[3]. These methods allow a systematic variation of the height (<180nm), density (70-500 1/µ m2) and diameter (10-40nm) of the pillars. After removing the etching mask hydrophobicity of the samples was additionaly modified by coating with HMDS (Hexamethyldisilane), OTMS (Octadecyltrimethoxysilane) or a fluorcarbonfilm fabricated by plasma-deposition. Wetting of water was studied by measuring advancing, static and receeding contact angles. First results demonstrate either the Wenzel or Cassie-Baxter-state of water drops on the nanostructured surfaces.
[1] G. Kästle et al., Adv. Funct. Mat. 13, 853 (2003)
[2] A. Seidenstücker et al., submitted
[3] F. Weigl et al., Diamond and rel. Mat. 15 1689 (2006)