Regensburg 2010 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 25: Application of Thin Films
DS 25.4: Vortrag
Mittwoch, 24. März 2010, 16:45–17:00, H8
Single Ion Lithography — •Hans-Gregor Gehrke1, Anne-Katrin Nix1, Johann Krauser2, Christina Trautmann3, Alois Weidinger4, and Hans Hofsäss1 — 1II. Physikalisches Institut, Universität Göttingen, Germany — 2Hochschule Harz, Wernigerode, Germany — 3Gesellschaft für Schwerionenforschung, Darmstadt, Germany — 4Hahn-Meitner-Institut, Berlin, Germany
Swift Heavy ion irradiation of polycarbonate creates latent tracks along each ion track. Chemical wet etching allows selective removal of the path creating small pores through the polymer film. In the past we developed a method to create thin polycarbonate films by spin coating allowing the etching of pores with diameters in the range of 50 - 80 nm. These nano-pores serve as templates to create nanostructures. Besides depositing materials through the pores, it is possible to sputter cavities into the substrate. This technique has some possible applications, as for example, the creation of structured substrates for nano-wires requiring small catalyst clusters (e.g. gold). The combination of creating cavities by sputtering and depositing the catalyst into cavities results in embedded catalyst clusters providing advantages for epitaxial growth. In addition, this procedure is a parallel process allowing to structure large areas with millions of devices simultaneously. Another application is the creation of electrode structures. We demonstrate the principle of creating a field emission structure using the described structuring method and the self-alignment of conducting nano-wires in diamond-like carbon created by the same ion during irradiation.