Regensburg 2010 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 29: Poster: Molecular Spintronics, Biomolecular and Functional Organic Layers, Organic Electronics and Photovoltaics, Plasmonics and Nanophotonics, Organic Thin Films, Nanoengineered Thin Films, Thin Film Characterisation,
DS 29.40: Poster
Mittwoch, 24. März 2010, 15:00–17:30, Poster A
Influence of Auxiliary Plasma Source on Properties of Photoactive TiO2 Films by MePIII&D — •Altin Gjevori1,2, Dietmar Hirsch1, Jurgen W. Gerlach1, Darina Manova1, and Stephan Mändl1 — 1Leibniz-Institut für Oberflächenmodifizierung, 04318 Leipzig, Germany — 2Faculty of Natural Sciences, University of Tirana, Tirana, Albania
For several years, TiO2 is receiving increasing scientific attention as one of the most promising photo catalysts with a huge potential for solving several different types of environmental problems. While TiO2 powders and nanoparticles are well known and widely used, thin film surfaces are less investigated but still highly desired for applications. For TiO2 polymorphs, anatase powder is reported to be a more potent photo catalyst than rutile. Metal plasma immersion ion implantation and deposition is employed to form titanium oxide films at room temperature. By applying high voltage pulses of up to 5 kV at a duty cycle of 30%, polycrystalline films could be obtained. Additionally, an RF plasma source was used to increase the ionisation of the background oxygen gas at different flow rates, thus enhancing the ion bombardment of the surface. AFM, SEM, XRD and surface energy measurements show that by employing the auxiliary RF plasma source, a lower oxygen gas flux is compensated by increasing the oxygen content compared to the case without auxiliary plasma.