Regensburg 2010 – wissenschaftliches Programm
Bereiche | Tage | Auswahl | Suche | Downloads | Hilfe
MM: Fachverband Metall- und Materialphysik
MM 26: Poster Session
MM 26.14: Poster
Dienstag, 23. März 2010, 14:45–16:30, Poster C
Molecular dynamics simulation of Ni/NiAl interfaces — •Stephen Hocker1, Siegfried Schmauder1, and Priyank Kumar2 — 1Institut für Materialprüfung, Werkstoffkunde und Festigkeitslehre, Universität Stuttgart, Stuttgart — 2Department of Metallurgical and Materials Engineering, Indian Institute of Technology Madras, Chennai, India
Molecular dynamics simulations are used to study the brittle/ductile interface Ni/B2-NiAl under mechanical loading. Uniaxial tensile tests perpendicular to the interface are performed. It is shown that interfaces have influence on strain induced material failure by nucleation of defects. Crack propagation in the (001) interface is investigated by applying load via fixed displacement boundary conditions. Determined crack velocities in the interface turned out to be clearly above the crack velocities in each of the respective materials.