Regensburg 2010 – wissenschaftliches Programm

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MM: Fachverband Metall- und Materialphysik

MM 42: Topical Session Multifunctional Materials III

MM 42.3: Vortrag

Mittwoch, 24. März 2010, 15:45–16:00, H6

Diffractive optics on contact lens: application of electron beam lithography on polymer material with curved structures — •Xin Jin¹, Dawit Gedamu¹, Rainer Adelung¹, Dirk Meyners², Eckhard Quandt², Matthias Kaläne², Kai Rossnagel³, Lutz Kipp³, and Frank Spors⁴ — ¹Functional Nanomaterials, Institute of Materials Science, CAU Kiel, Germany — ²Inorganic Functional Materials, Institute of Materials Science, Faculty of Engineering, CAU Kiel, Germany — ³Electronic Structure / Synchrotron Radiation, Institute for Experimental and Applied Physics, CAU Kiel, Germany — ⁴College of Optometry, Western University of Health Sciences, Ca, USA

The principle of a diffractive bifocal contact lens was first suggested in the 1980s in the treatment for presbyopia. But the products were not successful due to problems with the reduction of the contrast in the patient*s vision. However, with progress in both the fabrication method and the design of diffractive optics (e.g., photon sieves), the question about the application of diffractive optics on contact lenses can be asked again. Therefore, in this research, zone plates and photon sieves are manufactured on contact lenses using electron beam lithography (EBL). furthermore, the problems of applying EBL on polymer contact lenses employing curved surfaces are discussed.

Acknowledgement: We thank Janine Greve for skillful technical support