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DPG

Regensburg 2010 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 41: Poster Session I (Semiconductor Substrates: Epitaxy and growth; Semiconductor Substrates: Adsorbtion; Semiconductor Substrates: Solid-liquid interfaces; Semiconductor Substrates: Clean surfaces; Oxides and insulators: Epitaxy and growth; Oxides and insulators: Adsorption; Oxides and insulators: Clean surfaces; Organic, polymeric and biomolecular films - also with adsorbates; Organic electronics and photovoltaics, Surface chemical reactions; Heterogeneous catalysis; Phase transitions; Particles and clusters; Surface dynamics; Surface or interface magnetism; Electron and spin dynamics; Spin-Orbit Interaction at Surfaces; Electronic structure; Nanotribology; Solid/liquid interfaces; Graphene; Others)

O 41.30: Poster

Dienstag, 23. März 2010, 18:30–21:00, Poster B1

A comparative Atomic Force Microscopy study on the preparation of the polished (111) and cleaved (100) surfaces of Magnesium Fluoride (MgF2). — •Patrick Meisner, Enrico Barletta, and Klaus Wandelt — Inst. for phys. and theor. Chem., University of Bonn, Wegelerstr. 12 D-53115, Bonn, Germany

Alkaline earth fluorides are used for several applications in microelectronics, for example as protective coating and buffer layers for semiconductors. Because of its special optical attributes magnesium fluoride is also an important tool for the production of anti reflex coatings or for sealing Aluminium coated mirrors.Magnesium Fluoride is also used as catalyst in the chemical industry. Its birefringent effect makes it useful for non linear optics, and because of its wide transmitting window it is widely used for construction of high quality optical components. Consequently the finishing of the surface plays an important role on the performances of the final devices. The preparation of two different crystal faces, (111) and (100), was studied. Because of the low cleavage along the (111) surface, this surface orientation had to be prepared by cutting and polishing the crystal by abrasive submicrometer powders. On both surfaces, during cleaning of the fresh surface by thermal processes, morphological and structural effects were observed. Even during the molecular beam epitaxial growth, surfaces of different grade were achieved following different deposition conditions and post-deposition treatments. The achieved results point out to a big influence of the thermal treatments and to a better grade of the final surface after a reconstruction by MBE deposition of some mono-layers of fresh MgF2.

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